RF
Radiofrequency
CCP (Capacitively Coupled Plasma Source) etching machines cover logic chips from 65nm to 5nm and even more advanced processes.
ICP (Inductively Coupled Plasma Source) etching machines cover processes from 14nm to 5nm.
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NEUEET (Shenyang) Energy Engineering Technology Co., Ltd Digital Enabling & Industrial Interconnection
Contact Information
Headquarters address: No. 16, West Gate, Zhongke Town, No. 25, Innovation 2nd Road, Hunnan District, Shenyang City, Liaoning Province